DocumentCode :
1828130
Title :
Effect of microstructure on thermal-mechanical stress in 3D copper TSV structures
Author :
Wu, Zhiyong ; Huang, Zhiheng ; Conway, Paul P. ; Ma, Yucheng
Author_Institution :
Sch. of Phys. & Eng., Sun Yat-sen Univ., Guangzhou, China
fYear :
2011
fDate :
7-9 Dec. 2011
Firstpage :
450
Lastpage :
454
Abstract :
Electronic packaging technologies have developed into the 3D packaging era and the TSV structure is one of the possible technological routes. TSVs of small scales such as submicron or even nano scales are envisioned for 3D packaging. From a material point of view, microstructure and its related micro-processes involved at such small scales will have important impacts on the performance of the electronic packages. This paper focuses on modeling the microstructural effects on the thermal-mechanical behavior of Cu-TSVs. In the microstructural models, Cu grains inside the vias are simulated using the Voronoi algorithm. The Young´s moduli and Poisson´s ratios of different grains are determined by their crystallographic orientations. A coupled thermal-mechanical finite element analysis is then carried out to study the microstructural effects. The temperature distribution is not significantly affected by the non-uniform thermal conductivities in this study. The stress distribution in the anistropic model exhibits considerable differences from that of the reference model in which the vias are treated as bulk materials. The stress within the vias varies significantly and there are sites where the stress is as high as 240 MPa, which has not been found in the reference model. Therefore, the effects of microstructures inside the Cu TSV are obvious and the microstructures should be among the design factors for reliable 3D electronic packaging.
Keywords :
Young´s modulus; computational geometry; copper; crystal microstructure; finite element analysis; integrated circuit packaging; three-dimensional integrated circuits; 3D copper TSV structures; 3D electronic packaging; CU; Poisson ratios; Voronoi algorithm; Young´s moduli; bulk materials; coupled thermal-mechanical finite element analysis; crystallographic orientations; electronic packaging technologies; microstructure effect; nonuniform thermal conductivities; stress distribution; temperature distribution; thermal-mechanical stress; Conductivity; Copper; Microstructure; Stress; Temperature distribution; Thermal conductivity; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging Technology Conference (EPTC), 2011 IEEE 13th
Conference_Location :
Singapore
Print_ISBN :
978-1-4577-1983-7
Electronic_ISBN :
978-1-4577-1981-3
Type :
conf
DOI :
10.1109/EPTC.2011.6184463
Filename :
6184463
Link To Document :
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