Title :
Phosphorus and aluminum co-doped EDF insensitive to hydrogen exposure for extended L-band amplification
Author :
Haruna, Tetsuya ; Hirano, Masaaki ; Sasaki, Takashi
Author_Institution :
Opt. Commun. R&D Labs., Sumitomo Electr. Ind., Ltd., Yokohama
Abstract :
P/Al co-doped EDF without Ge is fabricated, which exhibits broad gain bandwidth from 1560 to 1620 nm. Its loss stability against hydrogen exposure is more than one order of magnitude superior to that of Al/Ge-doped EDF.
Keywords :
aluminium; laser stability; optical fibre amplifiers; phosphorus; L-band amplification; broad gain bandwidth; co-doped EDF insensitive; hydrogen exposure; loss stability; wavelength 1560 nm to 1620 nm; Aluminum; Bandwidth; Erbium-doped fiber amplifier; Hydrogen; L-band; Optical fiber communication; Refractive index; Research and development; Stability; Wavelength division multiplexing; (060,2290) Fiber materials; (060.2320) Fiber optics amplifiers and oscillators;
Conference_Titel :
Optical Fiber Communication - incudes post deadline papers, 2009. OFC 2009. Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4244-2606-5
Electronic_ISBN :
978-1-55752-865-0
