• DocumentCode
    1828917
  • Title

    Improved Micro-Contact Resistance Model that Considers Material Deformation, Electron Transport and Thin Film Characteristics

  • Author

    Coutu, Ronald A., Jr. ; McBride, John W. ; Starman, LaVern A.

  • fYear
    2009
  • fDate
    14-16 Sept. 2009
  • Firstpage
    298
  • Lastpage
    302
  • Keywords
    Contact resistance; Deformable models; Design engineering; Electric resistance; Electrons; Microswitches; Sputtering; Surface resistance; Switches; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Contacts, 2009 Proceedings of the 55th IEEE Holm Conference on
  • Conference_Location
    Vancouver, British Columbia, Canada
  • Print_ISBN
    978-1-4244-3613-2
  • Electronic_ISBN
    978-1-4244-3613-2
  • Type

    conf

  • DOI
    10.1109/HOLM.2009.5284384
  • Filename
    5284384
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1828917