DocumentCode :
1828917
Title :
Improved Micro-Contact Resistance Model that Considers Material Deformation, Electron Transport and Thin Film Characteristics
Author :
Coutu, Ronald A., Jr. ; McBride, John W. ; Starman, LaVern A.
fYear :
2009
fDate :
14-16 Sept. 2009
Firstpage :
298
Lastpage :
302
Keywords :
Contact resistance; Deformable models; Design engineering; Electric resistance; Electrons; Microswitches; Sputtering; Surface resistance; Switches; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Contacts, 2009 Proceedings of the 55th IEEE Holm Conference on
Conference_Location :
Vancouver, British Columbia, Canada
Print_ISBN :
978-1-4244-3613-2
Electronic_ISBN :
978-1-4244-3613-2
Type :
conf
DOI :
10.1109/HOLM.2009.5284384
Filename :
5284384
Link To Document :
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