DocumentCode
1830222
Title
Grating response time of photorefractive KNbO3:Rb+
Author
Zhang, Yuheng ; Campbell, Scott ; Yeh, Pochi ; Shen, Dezhong ; Ma, Xiaoyan ; Chen, Jiongyao
Author_Institution
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
fYear
1994
fDate
25-29 Jul 1994
Firstpage
284
Lastpage
286
Abstract
Photorefractive crystals play an increasingly important role in optical information processing. Some of these crystals have been used in a variety of optical computing applications. The photorefractive response time is a critical issue because it directly determines the processing speed of the devices. Crystals that are widely used at present, such as BaTiO3, LiNbO3, and SBN, etc., are relatively slow when the light intensity is 1 W/cm2. Semiconductor crystals such as GaAs and GaP have a higher speed but suffer from small coupling constants. For high processing speed, KNbO 3 has the best promise because it has the highest figure of merit among the oxide photorefractive crystals. Volt et. al studied the photorefractive response time of KNbO3:Fe. They found that reduction of the crystal could decrease the response time by several orders of magnitude. However, such KNbO3 crystals often become optically inhomogeneous after reduction. In this paper, we report our investigation of the transient photorefractive response of KNbO3:Rb+ crystals, which exhibit a fast response time while maintaining a significant gain and good optical homogeneity for information processing applications
Keywords
diffraction gratings; photorefractive materials; potassium compounds; rubidium; KNbO3:Rb; fast response time; grating response time; optical computing applications; photorefractive KNbO3:Rb+; processing speed; Crystals; Delay; Diffraction gratings; Information processing; Laser beams; Lenses; Optical modulation; Photorefractive effect; Photorefractive materials; Polarization;
fLanguage
English
Publisher
ieee
Conference_Titel
Nonlinear Optics: Materials, Fundamentals, and Applications, 1994. NLO '94 IEEE
Conference_Location
Waikoloa, HI
Print_ISBN
0-7803-1473-5
Type
conf
DOI
10.1109/NLO.1994.470818
Filename
470818
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