Title : 
Frequency-dependent via inductances for accurate power distribution network modeling
         
        
            Author : 
Ren, Liehui ; Kim, Jingook ; Feng, Gang ; Archambeault, Bruce ; Knighten, James L. ; Drewniak, James ; Fan, Jun
         
        
            Author_Institution : 
UMR/MST EMC Lab., Missouri Univ. of Sci. & Technol., Rolla, MO, USA
         
        
        
        
        
        
            Abstract : 
In power distribution network (PDN) modeling, interconnection inductance can play a critical role. It often determines the effectiveness of a component, such as a decoupling capacitor. This paper studies a typical one-plane-pair PDN structure with parallel power and ground planes and vertical vias in between. This work improves the conventional lumped circuit model for the PDN by introducing a model for the inductance of each via that is frequency-dependent. This frequency dependency is obtained from a rigorous cavity model formulation. The improved lumped circuit model is validated with the cavity model and the HFSS full-wave model. Further, the frequency-dependent mutual inductance between two vias can have either a positive or a negative value depending on via locations in the PDN structure, which is an interesting property that has not been reported.
         
        
            Keywords : 
circuit noise; inductance; interconnections; interference; lumped parameter networks; printed circuit design; HFSS full wave model; cavity model; frequency dependent via inductance; ground planes; interconnection inductance; lumped circuit model; one-plane-pair structure; parallel power; power distribution network modeling; vertical vias; Capacitors; Circuits; Clocks; Frequency; Geometry; Impedance; Inductance; Power systems; Solid modeling; Voltage;
         
        
        
        
            Conference_Titel : 
Electromagnetic Compatibility, 2009. EMC 2009. IEEE International Symposium on
         
        
            Conference_Location : 
Austin, TX
         
        
            Print_ISBN : 
978-1-4244-4266-9
         
        
            Electronic_ISBN : 
978-1-4244-4058-0
         
        
        
            DOI : 
10.1109/ISEMC.2009.5284628