• DocumentCode
    1834695
  • Title

    SiP2.0: What, when, and how?

  • Author

    Tadahiro Kuroda ; Masayuki Mizuno ; Ramchan Woo ; Nobukazu Kondo ; Yukihiro Urakawa ; Masayuki Miyamoto ; Koyu Asai ; Shintaro Yamamichi ; Jae Dong Kim

  • Author_Institution
    Keio Univ., Japan
  • fYear
    2008
  • fDate
    3-5 Nov. 2008
  • Firstpage
    485
  • Lastpage
    485
  • Abstract
    Up to now, SiP integration is widely used to increase chip integration density as well as flexibility of combination in heterogeneous devices. Emerging integration and stacking technologies such as 3D integration, TSV (Through Silicon Via), die-to-die proximity communications, EAD (Embedded Active Devices) are becoming greater attention. If we call the first generation SiP integration as “SiP1.0”, what is “SiP2.0” ? When and how is it practical? Each panelists will give their anticipation of future SiP, or “SiP2.0”. This panel talk is not an “A vs. B” type of debate, but more like an evening talk where each panelist presents their visions on the next generation SiP.
  • Keywords
    Chip scale packaging; Circuits; National electric code; Radio frequency; Silicon; Stacking; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 2008. A-SSCC '08. IEEE Asian
  • Conference_Location
    Fukuoka, Japan
  • Print_ISBN
    978-1-4244-2604-1
  • Electronic_ISBN
    978-1-4244-2605-8
  • Type

    conf

  • DOI
    10.1109/ASSCC.2008.4708832
  • Filename
    4708832