DocumentCode
1834982
Title
Study of methods for measuring mechanical properties of thin films in microelectromechanical systems (MEMS)
Author
Zou, Quanbo ; Li, Zhijian ; Liu, Litian
Author_Institution
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear
1995
fDate
24-28 Oct 1995
Firstpage
488
Lastpage
490
Abstract
Novel stress measurement methods for determining both tensile and compressive stress and Young´s modulus in surface micromachining are presented by investigating two techniques: (1) Beam Pull-in Voltage (V PI) and (2) Long Beam Deflection (LBD). Both tensile and compressive stress and Young´s modulus of thin film can be derived by use of the VPI method. In the LBD method, axial strain of beams can be converted into large transverse deflection which can be measured easily. These techniques have been analyzed, tested experimentally and comparison with other known stress measurement techniques show good consistency. Both techniques have been shown to be quite promising for simple and accurate on-chip thin-film stress measurements
Keywords
Young´s modulus; elastic moduli measurement; micromechanical devices; stress measurement; thin films; Young modulus; beam pull-in voltage; compressive stress; long beam deflection; mechanical properties measurement; microelectromechanical systems; onchip thin-film stress measurements; stress measurement methods; surface micromachining; tensile stress; thin films; Capacitive sensors; Data mining; Mechanical factors; Mechanical variables measurement; Microelectromechanical systems; Semiconductor device measurement; Strain measurement; Stress measurement; Transistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 1995 4th International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-3062-5
Type
conf
DOI
10.1109/ICSICT.1995.503327
Filename
503327
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