DocumentCode :
1834982
Title :
Study of methods for measuring mechanical properties of thin films in microelectromechanical systems (MEMS)
Author :
Zou, Quanbo ; Li, Zhijian ; Liu, Litian
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear :
1995
fDate :
24-28 Oct 1995
Firstpage :
488
Lastpage :
490
Abstract :
Novel stress measurement methods for determining both tensile and compressive stress and Young´s modulus in surface micromachining are presented by investigating two techniques: (1) Beam Pull-in Voltage (V PI) and (2) Long Beam Deflection (LBD). Both tensile and compressive stress and Young´s modulus of thin film can be derived by use of the VPI method. In the LBD method, axial strain of beams can be converted into large transverse deflection which can be measured easily. These techniques have been analyzed, tested experimentally and comparison with other known stress measurement techniques show good consistency. Both techniques have been shown to be quite promising for simple and accurate on-chip thin-film stress measurements
Keywords :
Young´s modulus; elastic moduli measurement; micromechanical devices; stress measurement; thin films; Young modulus; beam pull-in voltage; compressive stress; long beam deflection; mechanical properties measurement; microelectromechanical systems; onchip thin-film stress measurements; stress measurement methods; surface micromachining; tensile stress; thin films; Capacitive sensors; Data mining; Mechanical factors; Mechanical variables measurement; Microelectromechanical systems; Semiconductor device measurement; Strain measurement; Stress measurement; Transistors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1995 4th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-3062-5
Type :
conf
DOI :
10.1109/ICSICT.1995.503327
Filename :
503327
Link To Document :
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