DocumentCode
1835094
Title
Optical characteristics of erbium doped AlGaAs-GaAs heterostructures
Author
Dahua Zhang ; Zhang, T. ; Kolbas, R.M. ; Zavada, J.M.
Author_Institution
Dept. of Electr. & Comput. Eng., North Carolina State Univ., Raleigh, NC, USA
fYear
1995
fDate
24-28 Oct 1995
Firstpage
506
Lastpage
508
Abstract
Erbium (Er) doped AlGaAs-GaAs multiple quantum well heterostructures have been grown by molecular beam epitaxy and optically characterized using photoluminescence. It was found that the Er3+ luminescence of the MQW structures with Er doped GaAs quantum wells and undoped AlxGa1-xAs barriers was strongly dependent on the Al composition. This result suggests that the prolonged carrier lifetime in the barriers, where the X band is lower in energy than the Γ band, improves the energy transfer from the host semiconductor to the Er3+ ions. Emission intensity versus excitation power measurements were also performed and data indicate that a high efficiency of energy transfer can be achieved by incorporating Er in MQW heterostructures
Keywords
III-V semiconductors; aluminium compounds; carrier lifetime; erbium; gallium arsenide; molecular beam epitaxial growth; photoluminescence; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum wells; AlGaAs-GaAs:Er; carrier lifetime; emission intensity; energy transfer; excitation power measurements; molecular beam epitaxy; multiple quantum well heterostructures; photoluminescence; Charge carrier lifetime; Energy exchange; Erbium; Gallium arsenide; Luminescence; Molecular beam epitaxial growth; Optical beams; Photoluminescence; Power measurement; Quantum well devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 1995 4th International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-3062-5
Type
conf
DOI
10.1109/ICSICT.1995.503332
Filename
503332
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