DocumentCode :
1836206
Title :
Improvements to On-Wafer Noise Parameter Measurements
Author :
Hughes, Brian ; Tasker, Paul
Author_Institution :
HEWLETT PACKARD, MICROWAVE TECH. DIv., SANTA ROSA, CA, IAF, FREIBURG, GERMANY
Volume :
18
fYear :
1990
fDate :
Nov. 1990
Firstpage :
16
Lastpage :
25
Abstract :
A new system for measuring noise parameters on-wafer has been developed that incorporates three main new features: (1) the source can be tuned to any impedance including Zopt rather than pre-calibrated settings, (2) the system corrects for drift in second stage gain, and (3) calibration is simplified with an on-wafer noise source. This cold-noise measurement system uses a HP8510B network analyzer with a custom test-set that incorporates the input reflectometer between the DUT and tuner, and the output reflectometer between the DUT and the second stage. The noise figure of 0.25 mm pseudomorphic MODFETs were measured versus source impedance with the system. The standard four-parameter equation for modeling the dependence of noise figure on impedance was fitted to every measured data point (e.g., 32) including Fmin to better than 0.02 dB.
Keywords :
Calibration; Gain measurement; HEMTs; Impedance measurement; MODFETs; Measurement standards; Noise figure; Noise measurement; System testing; Tuners;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
ARFTG Conference Digest-Fall, 36th
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5686-1
Type :
conf
DOI :
10.1109/ARFTG.1990.323992
Filename :
4119564
Link To Document :
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