DocumentCode
1836206
Title
Improvements to On-Wafer Noise Parameter Measurements
Author
Hughes, Brian ; Tasker, Paul
Author_Institution
HEWLETT PACKARD, MICROWAVE TECH. DIv., SANTA ROSA, CA, IAF, FREIBURG, GERMANY
Volume
18
fYear
1990
fDate
Nov. 1990
Firstpage
16
Lastpage
25
Abstract
A new system for measuring noise parameters on-wafer has been developed that incorporates three main new features: (1) the source can be tuned to any impedance including Zopt rather than pre-calibrated settings, (2) the system corrects for drift in second stage gain, and (3) calibration is simplified with an on-wafer noise source. This cold-noise measurement system uses a HP8510B network analyzer with a custom test-set that incorporates the input reflectometer between the DUT and tuner, and the output reflectometer between the DUT and the second stage. The noise figure of 0.25 mm pseudomorphic MODFETs were measured versus source impedance with the system. The standard four-parameter equation for modeling the dependence of noise figure on impedance was fitted to every measured data point (e.g., 32) including Fmin to better than 0.02 dB.
Keywords
Calibration; Gain measurement; HEMTs; Impedance measurement; MODFETs; Measurement standards; Noise figure; Noise measurement; System testing; Tuners;
fLanguage
English
Publisher
ieee
Conference_Titel
ARFTG Conference Digest-Fall, 36th
Conference_Location
Monterey, CA, USA
Print_ISBN
0-7803-5686-1
Type
conf
DOI
10.1109/ARFTG.1990.323992
Filename
4119564
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