Title :
A new method for high aspect X-ray mask fabrication
Author :
Kang, S.X. ; Kang, H.Y. ; Grilli, A. ; Arco, A.
Author_Institution :
Center for Fundamental Phys., Univ. of Sci. & Technol. of China, Hefei, China
Abstract :
High aspect X-ray mask has been fabricated using electron beam lithography and x-ray lithography. Results show that 0.1 μm patterns with aspect up to 12 were successfully obtained. Processes were described
Keywords :
X-ray lithography; X-ray masks; electron beam lithography; 0.1 micron; X-ray lithography; electron beam lithography; fabrication; high aspect X-ray mask; Biomembranes; Electron beams; Fabrication; Gold; Materials science and technology; Mirrors; Resists; Scanning electron microscopy; Synchrotron radiation; X-ray lithography;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1995 4th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-3062-5
DOI :
10.1109/ICSICT.1995.503385
