DocumentCode
1836267
Title
A new method for high aspect X-ray mask fabrication
Author
Kang, S.X. ; Kang, H.Y. ; Grilli, A. ; Arco, A.
Author_Institution
Center for Fundamental Phys., Univ. of Sci. & Technol. of China, Hefei, China
fYear
1995
fDate
24-28 Oct 1995
Firstpage
668
Lastpage
670
Abstract
High aspect X-ray mask has been fabricated using electron beam lithography and x-ray lithography. Results show that 0.1 μm patterns with aspect up to 12 were successfully obtained. Processes were described
Keywords
X-ray lithography; X-ray masks; electron beam lithography; 0.1 micron; X-ray lithography; electron beam lithography; fabrication; high aspect X-ray mask; Biomembranes; Electron beams; Fabrication; Gold; Materials science and technology; Mirrors; Resists; Scanning electron microscopy; Synchrotron radiation; X-ray lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 1995 4th International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-3062-5
Type
conf
DOI
10.1109/ICSICT.1995.503385
Filename
503385
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