DocumentCode
1837339
Title
Cryogenic Vacuum On-Wafer Probe Svstem
Author
Laskar, J. ; Kruse, J. ; Feng, M. ; Kolodzey, J.
Author_Institution
Department of Electrical and Computer Engineering, Center for Compound Semiconductor Microelectronics, University of Illinois at Urbana-Champaign
Volume
20
fYear
1991
fDate
5-6 Dec. 1991
Firstpage
44
Lastpage
52
Abstract
We describe the the design of a novel cryogenic vacuum on-wafer probe system. Detailed descriptions of the measurement system, and the effect of calibration temperature on the measurement accuracy are given. We demonstrate the feasibility of making routine high frequency variable temperature measurements from 40 K to 300 K for long durations with a simple open cycle liquid nitrogen and liquid helium cooling systems. Cryogenic microwave measurements have been performed on advanced heterostructure bipolar transistors, pseudomorphic InGaAs/GaAs field-effect transistors, and high temperature superconducting thin film transmission lines. By characterizing state of the art high frequency transistors at cryogenic temperatures we not only explore the ultimate operation of these devices but also carry out comprehensive studies of the effects of parasitic elements, gate lengths, device structure and materials to determine fundamental transport properties. In addition, temperature dependant models are being developed for both bipolar and field-effect transistors.
Keywords
Cables; Calibration; Cryogenics; Frequency; Hardware; Microwave measurements; Nitrogen; Probes; Superconducting microwave devices; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
ARFTG Conference Digest-Winter, 38th
Conference_Location
San Diego, CA, USA
Print_ISBN
0-7803-5686-1
Type
conf
DOI
10.1109/ARFTG.1991.324037
Filename
4119613
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