• DocumentCode
    1837339
  • Title

    Cryogenic Vacuum On-Wafer Probe Svstem

  • Author

    Laskar, J. ; Kruse, J. ; Feng, M. ; Kolodzey, J.

  • Author_Institution
    Department of Electrical and Computer Engineering, Center for Compound Semiconductor Microelectronics, University of Illinois at Urbana-Champaign
  • Volume
    20
  • fYear
    1991
  • fDate
    5-6 Dec. 1991
  • Firstpage
    44
  • Lastpage
    52
  • Abstract
    We describe the the design of a novel cryogenic vacuum on-wafer probe system. Detailed descriptions of the measurement system, and the effect of calibration temperature on the measurement accuracy are given. We demonstrate the feasibility of making routine high frequency variable temperature measurements from 40 K to 300 K for long durations with a simple open cycle liquid nitrogen and liquid helium cooling systems. Cryogenic microwave measurements have been performed on advanced heterostructure bipolar transistors, pseudomorphic InGaAs/GaAs field-effect transistors, and high temperature superconducting thin film transmission lines. By characterizing state of the art high frequency transistors at cryogenic temperatures we not only explore the ultimate operation of these devices but also carry out comprehensive studies of the effects of parasitic elements, gate lengths, device structure and materials to determine fundamental transport properties. In addition, temperature dependant models are being developed for both bipolar and field-effect transistors.
  • Keywords
    Cables; Calibration; Cryogenics; Frequency; Hardware; Microwave measurements; Nitrogen; Probes; Superconducting microwave devices; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ARFTG Conference Digest-Winter, 38th
  • Conference_Location
    San Diego, CA, USA
  • Print_ISBN
    0-7803-5686-1
  • Type

    conf

  • DOI
    10.1109/ARFTG.1991.324037
  • Filename
    4119613