• DocumentCode
    1837859
  • Title

    Agile fab concepts for cost effective and QTAT mini fab

  • Author

    Mikata, Yuuichi ; Mitsutake, Kunihiro ; Arikado, Tsunetoshi ; Okumura, Katsuya

  • Author_Institution
    Process & Manuf. Eng. Center, Toshiba Corp., Yokohama, Japan
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    7
  • Lastpage
    10
  • Abstract
    Recently SoC devices require QTAT and low cost. Also SoC device quickly change its design so that total production amount is not so many. In this situation we propose the Agile fab to solve these problems. The basic concept of the Agile fab consists of following three ideas; (i) Small size Jab supported by virtual Jab, (ii) Multi-task and multi-functional tools, (iii) Minimization and smoothing of RPT (Raw Process Time). WIP control is important for maximum production and minimized X-factor. Multi-functional and multi-task tools make it possible to reduce the excess capacity and the excess investment. Those tools are furnace, dry etching, wet cleaning, stencil ion implantation. Reduction of RPT is achieved by the sequential process, stencil mask ion implantation process, scan-coating for insulating layers and new electro-plating process. The total RPT is reduced less than a half of conventional case. The tool numbers can be reduced to about a half using the multi-functional, multi-task tools and minimization of RPT
  • Keywords
    etching; furnaces; integrated circuit economics; integrated circuit technology; integrated circuit yield; ion implantation; minimisation; process control; semiconductor technology; surface cleaning; Agile fab; QTAT; SoC devices; cost; electro-plating process; minimization; multi-functional tools; raw process time; scan-coating; sequential process; smoothing; stencil ion implantation; stencil mask ion implantation; system on chip; virtual fab; wet cleaning; Accidents; Consumer electronics; Costs; Furnaces; Home appliances; Investments; Ion implantation; Manufacturing processes; Production; Smoothing methods;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing Symposium, 2001 IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-6731-6
  • Type

    conf

  • DOI
    10.1109/ISSM.2001.962902
  • Filename
    962902