DocumentCode :
1838071
Title :
Wafer level tracking and control to full mini-environment line
Author :
Uriga, Kensuke ; Crandell, Blaine
Author_Institution :
Texas Instruments Japan, Ibaraki, Japan
fYear :
2001
fDate :
2001
Firstpage :
51
Lastpage :
54
Abstract :
This paper addresses wafer level tracking as the key technology to achieve higher productivity in a full mini-environmentalized (M-E) manufacturing line. Texas Instruments has developed and installed the M-E and wafer level tracking control system for the new 8 inch line in Dallas and transferred the same concept to new 8 inch lines in other fabs. The wafer level tracking (WLT) system established the following: elimination of 100% of wafer scraps caused by mishandling by manufacturing technician; retention of the same working productivity in the M-E line as in legacy lines using open cassettes; provision of tracking data for wafer level fault detection. The approach, issues and achievements are discussed in this paper
Keywords :
computer integrated manufacturing; fault location; integrated circuit technology; integrated circuit yield; materials handling; process control; process monitoring; 8 in; M-E line; manufacturing technician handling; mini-environment line; mini-environmentalized manufacturing line; productivity; tracking data; wafer level control; wafer level fault detection; wafer level tracking; wafer level tracking technology; wafer scraps; working productivity; Automation; Computer integrated manufacturing; Control systems; Costs; Fault detection; Instruments; Optical character recognition software; Productivity; Protection; Pulp manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-6731-6
Type :
conf
DOI :
10.1109/ISSM.2001.962912
Filename :
962912
Link To Document :
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