DocumentCode
1838126
Title
A new manufacturing control system using Mahalanobis distance for maximising productivity
Author
Hayashi, Shunji ; Tanaka, Yoshikazu ; Kodama, Eiichi
Author_Institution
Miyazaki Oki Electr. Co. Ltd., Japan
fYear
2001
fDate
2001
Firstpage
59
Lastpage
62
Abstract
Primary productivity in the semiconductor manufacturing industry, which includes cycle time, cost and production, depends to a great extent on the capability of manufacturing administrators (MA), particularly with regard to the critical trade-off between cycle time and tool utilization. The Mahalanobis distance (MD) has significance in pattern recognition, and we have found a method to make use of the MD as the core of a manufacturing control system. By using this system, we can easily distinguish deviations from normality in respect of productivity, specify the root cause of the abnormality and decide how to prioritize the problem. As a result, we can efficiently concentrate limited resources on the root cause in the absence of a capable MA, and restore productivity on a minimum timescale
Keywords
fault diagnosis; integrated circuit yield; pattern recognition; process control; process monitoring; production testing; Mahalanobis distance; abnormality root cause; cycle time; manufacturing administrators; manufacturing control system; manufacturing cost; manufacturing deviations; pattern recognition; productivity; productivity maximisation; semiconductor manufacturing industry; tool utilization; Control systems; Costs; Manufacturing industries; Monitoring; Pattern recognition; Production systems; Productivity; Queueing analysis; Random access memory; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location
San Jose, CA
Print_ISBN
0-7803-6731-6
Type
conf
DOI
10.1109/ISSM.2001.962914
Filename
962914
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