Title :
Physics and chemistry of partial discharge and corona - recent advances and future challenges
Author_Institution :
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Abstract :
The focus of the present review is on relatively recent work published within the past fifteen years dealing primarily with the basic physical and chemical processes responsible for, or associated with, the discharge phenomenon. Particular emphasis is given to work carried out in the NIST laboratory using examples of results obtained for air, SF 6, and SF6/O2 gas mixtures in point-plane or point-dielectric barrier gaps
Keywords :
partial discharges; NIST laboratory; O2; SF6; SF6-O2; SF6/O2 gas mixtures; air; chemical processes; corona; discharge phenomenon; partial discharge; physical processes; point-dielectric barrier gaps; point-plane gaps; Chemistry; Conducting materials; Corona; Dielectric materials; Dielectrics and electrical insulation; Gas insulation; Partial discharges; Physics; Pulse measurements; Signal processing;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1994., IEEE 1994 Annual Report., Conference on
Conference_Location :
Arlington, TX
Print_ISBN :
0-7803-1950-8
DOI :
10.1109/CEIDP.1994.591675
