• DocumentCode
    1838712
  • Title

    Infrastructure for successful BEOL characterization and yield ramp at the 65 nm node and below

  • Author

    DeBord, Jeffrey R D ; Grice, Tom ; Garcia, Roberto ; Yeric, Greg ; Cohen, Ethan ; Sutandi, Augustinus ; Garcia, John ; Green, Gary

  • Author_Institution
    Texas Instrum. Inc., Dallas, TX, USA
  • fYear
    2005
  • fDate
    6-8 June 2005
  • Firstpage
    27
  • Lastpage
    29
  • Abstract
    BEOL yield characterization is increasingly difficult on advanced technology nodes using traditional short flow devices. A new BEOL technology development read only memory (TDROM™) has been used to successfully drive BEOL yield learning on the 65 nm node. The addressable nature of the TDROM™ allows isolation of all fails to within 2 um2 using known memory testing techniques which has resulted in accelerated yield learning, and PFA utilization. The eight megabit array size allows exhaustive DOE for all design rules and margins.
  • Keywords
    integrated circuit yield; read-only storage; 65 nm; BEOL technology development read only memory; BEOL yield characterization; DOE; PFA utilization; TDROM; accelerated yield learning; array size; memory testing; yield ramp; Inorganic materials; Instruments; Isolation technology; Life estimation; Materials testing; Metallization; Metals industry; Read only memory; Vehicles; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference, 2005. Proceedings of the IEEE 2005 International
  • Print_ISBN
    0-7803-8752-X
  • Type

    conf

  • DOI
    10.1109/IITC.2005.1499912
  • Filename
    1499912