• DocumentCode
    1839175
  • Title

    Reduction of PFC emissions by gas circulation cleaning in plasma CVD

  • Author

    Nakata, Rempei ; Kubota, Hiroshi ; Kaji, Naruhiko ; Sakai, Itsuko ; Yoda, Takashi ; Okumura, Katsuya

  • Author_Institution
    Process. & Manuf. Eng. Centre, Toshiba Corp., Yokohama, Japan
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    229
  • Lastpage
    232
  • Abstract
    A new method for plasma-CVD chamber cleaning using gas circulation has been developed. Unused gas contained in the exhaust gas during chamber cleaning was returned to chamber, and it was reused. Using this method, approximately 50% reduction of the amount of C2F6 used and net PFC emissions could be achieved without increasing the cleaning endpoint time
  • Keywords
    air pollution control; plasma CVD; recycling; semiconductor technology; surface cleaning; cleaning endpoint time; exhaust gas; gas circulation; perfluorocompound emissions reduction; plasma-CVD chamber cleaning; semiconductor industry; Cleaning; Electronics industry; Fluid flow; Gases; Plasma applications; Plasma chemistry; Plasma materials processing; Pressure control; Semiconductor films; Valves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing Symposium, 2001 IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-6731-6
  • Type

    conf

  • DOI
    10.1109/ISSM.2001.962955
  • Filename
    962955
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1839175