DocumentCode :
1839707
Title :
The spidermask: a new approach for yield monitoring using product adaptable test structures
Author :
Beckers, S. ; Hiltrop, C.
Author_Institution :
Mietec NV, Oudenaarde, Belgium
fYear :
1990
fDate :
5-7 March 1990
Firstpage :
61
Lastpage :
66
Abstract :
An approach for yield monitoring based on a test vehicle that consists of structures, built on the underground of a high volume product is described. A specially designed metal mask, called spidermask, together with its appropriate contact mask, isolates and contacts these individual structures to create a complete yield monitor set. The major advantage of this type of structure is the close relationship between the measurement results on the test structure itself and the actual performance of the corresponding product. As a consequence, the existing yield model is adapted to conform to the yield monitor data. The spidermask was implemented in a CMOS and in a mixed bipolar-CMOS technology. The data of both yield monitors are presented, and the relationship with the yield model is demonstrated.<>
Keywords :
BIMOS integrated circuits; CMOS integrated circuits; integrated circuit testing; BiCMOS; CMOS; bipolar-CMOS technology; contact mask; high volume product; metal mask; product adaptable test structures; spidermask; test vehicle; yield model; yield monitoring; CMOS technology; Circuit testing; Integrated circuit modeling; Integrated circuit testing; Monitoring; Performance evaluation; Product design; Production; Semiconductor device modeling; Vehicles;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1990. ICMTS 1990. Proceedings of the 1990 International Conference on
Conference_Location :
San Diego, CA, USA
Type :
conf
DOI :
10.1109/ICMTS.1990.67881
Filename :
67881
Link To Document :
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