DocumentCode
1840250
Title
300 mm factory automation experience and challenges for wafer foundry fabs
Author
Hung, Chin-Hui ; Lin, Li-Ren
Author_Institution
Taiwan Semicond. Manuf. Co. Ltd., Taiwan
fYear
2001
fDate
2001
Firstpage
377
Lastpage
380
Abstract
As the semiconductor industry increases interest in 300 mm wafer size transition, Taiwan Semiconductor Manufacturing Company (TSMC) is also participating in the 300 mm development and mass production. TSMC uses a pilot line of 4.5 K monthly output capacity to gain process and tool expertise and to develop appropriate 300 mm factory automation know-how for the set-up of the next mass production 300 mm fabs. The goal is to achieve or exceed the current 200 mm foundry service, which offers leading edge technology, good on-time delivery, and excellent product quality for 300 mm fabs. A lot of experience has been learned and some challenges have been identified after operating this 300 mm pilot line for one year. These experiences and challenges are discussed in this paper
Keywords
computer integrated manufacturing; integrated circuit manufacture; quality control; 300 mm; TSMC; Taiwan Semiconductor Manufacturing Company; factory automation; leading edge technology; mass production; on-time delivery; product quality; wafer foundry fabs; wafer size; Computer integrated manufacturing; Copper; Electronics industry; Foundries; Manufacturing automation; Mass production; Materials handling; Production systems; Safety; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location
San Jose, CA
Print_ISBN
0-7803-6731-6
Type
conf
DOI
10.1109/ISSM.2001.962994
Filename
962994
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