DocumentCode :
1841011
Title :
New chemical removing and air cooling technology for clean room recirculation air using chilled pure water showering method
Author :
Wakamatsu, Hidetoshi ; Matsuki, Mikio ; Tanaka, Norio ; Iwanaga, Yuji ; Murata, Koichi
Author_Institution :
Oki Electr. Ind. Co. Ltd., Tokyo, Japan
fYear :
2001
fDate :
2001
Firstpage :
485
Lastpage :
488
Abstract :
We have developed a new chemical removing and air cooling technique for clean room recirculation air using a gas-liquid contact method that consists of a combination of chilled pure water showering and optimum packing material. We have tested a new treatment system using this technique in an actual photolithography clean room finding many kinds of chemical contaminants of water-solubility substances such as NH4+ and amine ions, and have found it to be a sufficiently practical wet-type filtration method having both functions of chemical cleanliness control and air cooling capacity control. In addition, this new system has a very simple structure, less power consumption and is maintenance free. Furthermore, the total cost including the initial and running cost of the new wet-type chemical filtration system for clean room recirculation air using our new technique can be reduced by about 30%, as compared with that of a conventional dry-type chemical filter removal system
Keywords :
air conditioning; clean rooms; cooling; environmental engineering; filtration; impurities; integrated circuit manufacture; photolithography; water; H2O; IC manufacture; NH4; air cooling capacity control; air cooling technique; amine ions; chemical cleanliness control; chemical contaminants; chemical removing technique; chilled pure water showering method; clean room recirculation air; gas-liquid contact method; maintenance free system; optimum packing material; photolithography clean room; power consumption reduction; treatment system; water-solubility substances; wet-type filtration method; Chemical technology; Control systems; Cooling; Costs; Energy consumption; Filters; Filtration; Lithography; System testing; Temperature control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Symposium, 2001 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-6731-6
Type :
conf
DOI :
10.1109/ISSM.2001.963021
Filename :
963021
Link To Document :
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