DocumentCode :
1842503
Title :
Non arcing electric contact device using the MEMS multi-electrodes
Author :
Yonezawa, Yu. ; Wakatsuki, Noboru ; Satoh, Yoshio ; Nakatani, Tadashi ; Sawa, Koichiro
Author_Institution :
Ishinomaki Senshu Univ., Japan
fYear :
2004
fDate :
20-23 Sept. 2004
Firstpage :
236
Lastpage :
241
Abstract :
We proposed a new electric contact device that suppresses the arc phenomena. Electric contact functions are divided into energizing and switching. Switching contacts are the multi-electrodes and each electrode current is suppressed by series resistance. For realizing of the multi-contacting, cantilever beam array electrodes were formed on silicon substrate using micro electromechanical systems (MEMS) technology. Finite element method was used for optimizing structure. Reactive ion etching was used for making of cantilever. 0.97 A of contact current was broken by the Au plating electrodes.
Keywords :
arcs (electric); contact resistance; electrical contacts; electrodes; electroplating; elemental semiconductors; finite element analysis; gold; microswitches; silicon; sputter etching; 0.97 A; Au; Au plating electrodes; MEMS multielectrodes; Si; cantilever beam array electrodes; contact current; electric contact functions; finite element method; ion etching; microelectromechanical systems technology; nonarcing electric contact device; series resistance; silicon substrate; switching contacts; Contact resistance; Electric resistance; Electrodes; Electromechanical systems; Etching; Finite element methods; Micromechanical devices; Optimization methods; Silicon; Structural beams;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Contacts, 2004. Proceedings of the 50th IEEE Holm Conference on Electrical Contacts and the 22nd International Conference on Electrical Contacts
Print_ISBN :
0-7803-8460-1
Type :
conf
DOI :
10.1109/HOLM.2004.1353124
Filename :
1353124
Link To Document :
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