Non arcing electric contact device using the MEMS multi-electrodes

Author

Yonezawa, Yu. ; Wakatsuki, Noboru ; Satoh, Yoshio ; Nakatani, Tadashi ; Sawa, Koichiro

Author_Institution

Ishinomaki Senshu Univ., Japan

fYear

2004

fDate

20-23 Sept. 2004

Firstpage

236

Lastpage

241

Abstract

We proposed a new electric contact device that suppresses the arc phenomena. Electric contact functions are divided into energizing and switching. Switching contacts are the multi-electrodes and each electrode current is suppressed by series resistance. For realizing of the multi-contacting, cantilever beam array electrodes were formed on silicon substrate using micro electromechanical systems (MEMS) technology. Finite element method was used for optimizing structure. Reactive ion etching was used for making of cantilever. 0.97 A of contact current was broken by the Au plating electrodes.

Keywords

arcs (electric); contact resistance; electrical contacts; electrodes; electroplating; elemental semiconductors; finite element analysis; gold; microswitches; silicon; sputter etching; 0.97 A; Au; Au plating electrodes; MEMS multielectrodes; Si; cantilever beam array electrodes; contact current; electric contact functions; finite element method; ion etching; microelectromechanical systems technology; nonarcing electric contact device; series resistance; silicon substrate; switching contacts; Contact resistance; Electric resistance; Electrodes; Electromechanical systems; Etching; Finite element methods; Micromechanical devices; Optimization methods; Silicon; Structural beams;

fLanguage

English

Publisher

ieee

Conference_Titel

Electrical Contacts, 2004. Proceedings of the 50th IEEE Holm Conference on Electrical Contacts and the 22nd International Conference on Electrical Contacts

Print_ISBN

0-7803-8460-1

Type

conf

DOI

10.1109/HOLM.2004.1353124

Filename

1353124