• DocumentCode
    1842511
  • Title

    Micro-ball bump for flip chip interconnections

  • Author

    Shimokawa, Kenji ; Hashino, Eiji ; Ohzeki, Y. ; Tatsumi, Kohei

  • Author_Institution
    R&D Labs., Nippon Steel Corp., Kawasaki, Japan
  • fYear
    1998
  • fDate
    25-28 May 1998
  • Firstpage
    1472
  • Lastpage
    1476
  • Abstract
    Micro-ball bump technology has been developed for flip chip (FC) interconnections. This technology is based on (1) a production method of fine metal balls (micro-balls) and (2) a gang-bonding method for forming bumps (micro-ball bumps) on chip electrodes. Solder balls of 60-150 mm and gold balls of 35-100 mm in diameter were prepared with extremely uniform diameters and high sphericity. After holding these micro-balls on through-holes of an arrangement plate by a vacuum suction method, the micro-balls were transferred onto the electrodes of the chips in order to form the micro-ball bumps. An excess ball eliminating system and a ball bouncing system were developed for arranging the ball successfully on the plate. The cycle time of the originally developed mounter was 20 seconds for a chip with 300 bumps. Both bumping on a single chip and on multiple chips in a wafer were possible. The micro-solder bumps were formed onto the electrodes covered with under bump metals (UBMs). The micro-solder-balls of 150 mm in diameter were transferred onto the flux printed electrodes of a chip with 220 mm pitch and 45×45 area array. The micro-solder bumps were uniform in composition, volume, and height because of the use of the micro-solder-balls with precisely controlled diameter and composition. Using the micro-gold-balls of 35 mm in diameter, the bumps with 50 mm pitch were formed on Al pads by means of thermocompression bonding. The proposed micro-ball bump technology could be applied to bumping not only for FC interconnections, but also for TABs
  • Keywords
    fine-pitch technology; flip-chip devices; integrated circuit interconnections; lead bonding; soldering; tape automated bonding; 35 to 220 mm; Al; Al pads; Au; Au balls; TAB; ball bouncing system; chip electrodes; excess ball eliminating system; fine metal balls; flip chip interconnections; flux printed electrodes; gang-bonding method; micro-ball bump technology; production method; thermocompression bonding; Chemical vapor deposition; Costs; Electrodes; Flip chip; Gold; Printing; Production; Steel; Wafer bonding; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components & Technology Conference, 1998. 48th IEEE
  • Conference_Location
    Seattle, WA
  • ISSN
    0569-5503
  • Print_ISBN
    0-7803-4526-6
  • Type

    conf

  • DOI
    10.1109/ECTC.1998.678939
  • Filename
    678939