DocumentCode :
1842764
Title :
Rare-earth doped silica planar waveguide lasers fabricated by flame hydrolysis deposition and reactive ion etching
Author :
Bonar, J.R. ; Bebbbington, J.A. ; Aitchison, J.S. ; Maxwell, G.D. ; Ainslie, B.J.
Author_Institution :
Glasgow Univ., UK
fYear :
1994
fDate :
34631
Firstpage :
42522
Lastpage :
42525
Abstract :
Our results on both solution doped and aerosol doped silica waveguide lasers have been described. Using the solution doping technique and optimising the output coupling a Nd-doped laser with a slope efficiency of 10 % has been demonstrated. This figure is greater than has been observed before . Laser oscillation using the aerosol doping technique has also been observed for the first time. It is envisaged that monolithic integration of both active and passive devices will be possible using selective area doping techniques and grating structures
Keywords :
diffraction gratings; 10 percent; active devices; aerosol doped; flame hydrolysis deposition; grating structures; laser oscillation; monolithic integration; output coupling; passive devices; rare-earth doped silica planar waveguide laser fabrication; reactive ion etching; selective area doping techniques; slope efficiency; solution doped;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Planar Silicon Hybrid Optoelectronics (Digest No. 1994/198), IEE Colloquium on
Conference_Location :
London
Type :
conf
Filename :
678963
Link To Document :
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