• DocumentCode
    1850431
  • Title

    A New Empirical Gate Capacitance Model for PHEMT and MESFET Transistors

  • Author

    Loo-Yau, J.R. ; Infante-Galindo, R. ; Reynoso-Hernández, J.A.

  • Author_Institution
    Universidad Autónoma de Guadalajara - Coordinación de Ciencia y TecnologÃ\xada ¿ Facultad de IngenierÃ\xada Electrónica, Dpto de Comunicaciones, Guadalajara, Jalisco., México; email: jloo@cu.gdl.uag.mx
  • Volume
    40
  • fYear
    2001
  • fDate
    Nov. 2001
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    This work deals with a nonlinear model for the gate-source capacitance CGS (VGS, VDS) and gate-drain capacitance CGD (VGS, VDS) of GaAs MESFET, HEMT and PHEMT transistors. An analytical bias dependent expression for modeling the CGS (VGS, VDS) and CGD (VGS, VDS) capacitances is developed. The CGS (VGS, VDS) and CGD (VGS, VDS) experimental values are obtained using a multibias extraction of the small signal equivalent circuit procedure. Good agreement between modeled and experimental data, as a function of gate-source and drain-source bias, is obtained. The main feature of the proposed nonlinear model is that no optimization is needed to achieve a good fit of modeled to experimental data.
  • Keywords
    Capacitance; Data mining; Equivalent circuits; FETs; Gallium arsenide; HEMTs; MESFETs; PHEMTs; Predictive models; Pulse amplifiers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ARFTG Conference Digest-Fall, 58th
  • Conference_Location
    San Diego, CA, USA
  • Print_ISBN
    0-7803-5686-1
  • Type

    conf

  • DOI
    10.1109/ARFTG.2001.327490
  • Filename
    4120193