Title :
Development of 3-axis nano stage for precision positioning in lithography system
Author :
Lee, Dong-Ju ; Lee, Kang-Nyung ; Park, No-Cheol ; Park, Young-Pil ; Kim, Hyuk ; Lee, Suk-Won ; Choi, Hyoung Gil ; Lee, Moon Gu ; Uh, Jiho ; Park, Jung-Woo ; Choi, Yong-Hwan ; Lee, Dong-Jin
Author_Institution :
Center for Inf. Storage Device, Yonsei Univ., Seoul, South Korea
Abstract :
The precision positioning system requires robust structural design to obtain enough bandwidth and efficient magnetic circuit to have fast access time. In this paper, the 3-axis nano stage was proposed and dynamic characteristics was improved by design of experiments (DOE) based on specifications of our precision positioning device. Finally, it was checked that the designed actuator had the proper dynamic characteristics through dynamic experiments.
Keywords :
design of experiments; nanolithography; position control; semiconductor device manufacture; 3-axis nano stage; design of experiments; lithography system; precision positioning system; robust structural design; Bandwidth; Coils; DC motors; Hydraulic actuators; Iron; Lithography; Magnetic circuits; Robustness; Semiconductor device manufacture; US Department of Energy;
Conference_Titel :
Mechatronics and Automation, 2005 IEEE International Conference
Conference_Location :
Niagara Falls, Ont., Canada
Print_ISBN :
0-7803-9044-X
DOI :
10.1109/ICMA.2005.1626794
