Title :
Pore formation in inorganic-organic hybrid material by oxygen plasma treatment
Author :
Aura, S. ; Jokinen, V. ; Baumann, M. ; Franssila, S.
Author_Institution :
Dept. of Micro & Nanosci., Helsinki Univ. of Technol., Espoo, Finland
Abstract :
In this work, the use of inorganic-organic hybrid material, ORMOCER (registered trademark of Microresist Technology), is studied. Pores are formed by oxygen plasma which makes the pore formation on pre-patterned surfaces possible. Patterning of porous and non-porous areas on a same substrate can be done by using shadow mask or a deposited thin film as a mask.
Keywords :
masks; nanoporous materials; organic-inorganic hybrid materials; plasma materials processing; polymers; ultraviolet lithography; ORMOCER; UV-embossing; UV-lithography; inorganic-organic hybrid material; nanoporous; plasma treatment; polymers; shadow mask; thin film; Chemical technology; Etching; Nanoporous materials; Nanostructured materials; Organic inorganic hybrid materials; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Polymers; Polymers; hybrid materials; nanoporous; plasma;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-4190-7
Electronic_ISBN :
978-1-4244-4193-8
DOI :
10.1109/SENSOR.2009.5285462
