DocumentCode
1853904
Title
Boron diffusion induced shunts
Author
Zin, Ngwe ; Blakers, Andrew
Author_Institution
Centre for Sustainable Energy Syst. (CSES), Australian Nat. Univ., Canberra, ACT, Australia
fYear
2011
fDate
19-24 June 2011
Abstract
Various types of shunt occur in solar cells, including process errors, defects, tunnel shunts between adjacent opposing diffusions and pinholes in insulating dielectric layers used to separate opposite-polarity regions. We have found that boron diffusions into small windows in dielectric layers generate pinholes in the layers following the removal of borosilicate glass (BSG) after the diffusion. These “boron-spots” lie close to the edge of the diffusion windows. If a phosphorus diffused region underlies the dielectric then subsequent metallisation can short circuit the two regions.
Keywords
boron; borosilicate glasses; diffusion; metallisation; phosphorus; solar cells; boron diffusion induced shunts; boron spots; borosilicate glass; diffusion windows; insulating dielectric layers; metallisation; opposite polarity regions; phosphorus diffused region; process errors; solar cells; tunnel shunts; Boron; Conferences; Dielectrics; Photovoltaic cells; Photovoltaic systems; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location
Seattle, WA
ISSN
0160-8371
Print_ISBN
978-1-4244-9966-3
Type
conf
DOI
10.1109/PVSC.2011.6185871
Filename
6185871
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