A monolithic integrated micromachined piezoresistive flow sensor

Author

Li, Dan ; Zhao, T. ; Qian, L. ; Yang, Z.C. ; Zhang, Dacheng C.

Author_Institution

Nat. Key Lab. of Micro/Nano Fabrication Technol., Peking Univ., Beijing, China

fYear

2009

fDate

21-25 June 2009

Firstpage

260

Lastpage

263

Abstract

In this paper, a monolithic integrated piezoresistive flow sensor is presented, which was fabricated with an intermediate CMOS MEMS process compatible with pressure sensors. Four symmetrically arranged silicon diaphragms with piezoresistors on them are used to sense the drag force induced by the input gas flow. Signal conditioning CMOS circuit with temperature compensation was designed and tested, the resulting temperature coefficient is 6%FS/100degC. The integrated flow sensor was packaged and tested, and the resolution is less than 0.1 L/min with range of 0.1-5 L/min.

Keywords

CMOS integrated circuits; diaphragms; elemental semiconductors; flow measurement; flow sensors; integrated circuit packaging; integrated circuit testing; micromachining; microsensors; piezoresistive devices; silicon; drag force; integrated flow sensor packaging; integrated flow sensor testing; intermediate CMOS MEMS process; microfabrication; monolithic micromachined piezoresistive flow sensor; piezoresistors; signal conditioning CMOS circuit; symmetrically arranged silicon diaphragm; temperature coefficient; temperature compensation; CMOS process; Circuit testing; Drag; Fluid flow; Force sensors; Micromechanical devices; Piezoresistance; Piezoresistive devices; Silicon; Temperature sensors; flow sensor; intermediate CMOS MEMS; monolithic integration; piezoresistor;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International

Conference_Location

Denver, CO

Print_ISBN

978-1-4244-4190-7

Electronic_ISBN

978-1-4244-4193-8

Type

conf

DOI

10.1109/SENSOR.2009.5285515

Filename

5285515