DocumentCode :
1854833
Title :
Investigation of aluminum-alloyed local contacts for rear surface-passivated silicon solar cells
Author :
Rauer, Michael ; Schmiga, C. ; Rühle, Karola ; Woehl, Robert ; Hermle, Martin ; Glunz, Stefan W.
Author_Institution :
Fraunhofer ISE, Freiburg, Germany
fYear :
2011
fDate :
19-24 June 2011
Abstract :
Summary form only given. The surface passivation of rear aluminum-alloyed p+ emitters is highly beneficial to increase the efficiency of back-junction n-type silicon solar cells, thus however demanding the application of locally defined emitter contacts. The formation of the rear contact by full-area screen-printing and alloying of Al-pastes on the locally opened contact points in the passivation layers exhibits two main problems: (i) increase of the contact depth leading to an enlargement of the contact area and (ii) low Al-p+ emitter thicknesses underneath the point contacts, both implying the danger of emitter shunts. In this study we therefore focus on controlling the formation and structural properties of contact points by systematically modifying the composition of the rear Al paste. By examining the contact geometry over a broad range of pitches, we demonstrate that the contact point depth and the Al-p+ emitter thickness in the contact region are directly linked to the percentage of Si that is dissolved into the Al-Si melt during alloying. For conventional Al pastes, the Si percentage in the melt was calculated to be far too low, so that we provided additional Si by manually adding Si powder to the Al paste. Thus, we could significantly reduce the contact depth and significantly enlarge the Al-p+ thickness in the point contacts, respectively. A first quantitative evaluation of the electrical properties was carried out, showing that the saturation current density is decreased by increasing the Si content of the paste, very likely due to the decreased contact area and improved electron shielding. In summary, we demonstrate that the local rear contact formation by alloying of full-area screen-printed Al pastes can be considerably improved by intentionally adding Si to the paste. The results of this investigation are highly interesting for applications to both n-type and p-type Si solar cells with passivated rear side.
Keywords :
aluminium alloys; current density; elemental semiconductors; passivation; point contacts; silicon; solar cells; Al-Si; aluminum-alloyed local contacts; back-junction n-type silicon solar cell efficiency; contact area; contact geometry; contact point depth; electrical properties; emitter shunts; full-area screen-printed aluminum pastes; full-area screen-printing; improved electron shielding; local rear contact formation; n-type silicon solar cells; p-type silicon solar cells; passivation layers; rear aluminum-alloyed p+-emitters; rear surface-passivated silicon solar cells; saturation current density; Alloying; Contacts; Passivation; Photovoltaic cells; Silicon; Solar power generation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location :
Seattle, WA
ISSN :
0160-8371
Print_ISBN :
978-1-4244-9966-3
Type :
conf
DOI :
10.1109/PVSC.2011.6185914
Filename :
6185914
Link To Document :
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