DocumentCode :
1854992
Title :
Optical study of Ge quantum dots and infrared photodetectors
Author :
Wei, Rongshan ; Deng, Ning ; Wang, Minsheng ; Zhang, Shuang ; Chen, Peiyi
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
fYear :
2005
fDate :
11-15 July 2005
Firstpage :
792
Abstract :
Stacked Ge quantum dots were grown on Si(100) by ultra-high vacuum chemical vapor deposition (UHV/CVD). Obvious blueshift (87 meV) observed from PL spectrum under 10 K demonstrates strong quantum confinement in Ge dots. Based on the material, PIiN structure quantum dot infrared photodetectors (QDIPs) were fabricated. At room temperature, I-V measurement showed a low dark current density of 1.7 × 10-6 A/cm2 at -3 V. The maximum photocurrent responsivity of 0.52 A/W at 774 nm was achieved, and 0.043 mA/W at 1.31 μm was found. The dots layers were considered to trap the light in the intrinsic region, and thus increase the absorption. Finally, samples of structural optimization were proposed.
Keywords :
chemical vapour deposition; current density; dark conductivity; elemental semiconductors; germanium; infrared detectors; photoconductivity; photodetectors; photoluminescence; semiconductor growth; semiconductor quantum dots; spectral line shift; 1.31 micron; 10 K; 293 to 298 K; 774 nm; CVD; Ge; I-V measurement; Si; Si(100) surface; UHV; blueshift; dark current density; infrared photodetectors; photocurrent; photoluminescence spectrum; quantum confinement; quantum dots; structural optimization; ultra-high vacuum chemical vapor deposition; Chemical vapor deposition; Current measurement; Dark current; Density measurement; Elementary particle vacuum; Optical materials; Photodetectors; Potential well; Quantum dots; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN :
0-7803-9199-3
Type :
conf
DOI :
10.1109/NANO.2005.1500650
Filename :
1500650
Link To Document :
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