DocumentCode :
1856569
Title :
Study on silicon window polarity of partial-SOI LDMOS power devices
Author :
Yue Hu ; Hao Wang ; Cheng Wang ; Jin He ; Xiaoan Zhu ; Sheng Chang ; Qijun Huang ; Dewen Wang ; Qingxing He ; Caixia Du ; Shengju Zhong
Author_Institution :
Shenzhen SOC Key Lab., Peking Univ., Shenzhen, China
fYear :
2013
fDate :
26-28 Aug. 2013
Firstpage :
278
Lastpage :
281
Abstract :
The Effect of silicon window polarity on partial-SOI (partial silicon-on-insulator, PSOI) LDMOS power devices under high-voltage operation is studied. Different polarities of the silicon window in PSOI LDMOSFETs are analyzed to investigate their effects on electrical characteristics: breakdown voltage (BV) and on-resistance (Ron). In partial-SOI LDMOSFETs, the P-type silicon window is considered as a part of the substrate, while the N-type silicon window falls into the drift region, which affects the high-voltage operation of devices. The two-dimensional (2-D) simulation results show that the breakdown voltage of PSOI LDMOSFET with P-type window is higher than that of PSOI LDMOSFET with N-type window, while the on-resistance of PSOI LDMOSFET with P-type window is lower than that of PSOI LDMOSFET with N-type window.
Keywords :
elemental semiconductors; power MOSFET; semiconductor device breakdown; silicon; silicon-on-insulator; Si; breakdown voltage; electrical characteristics; high-voltage operation; on-resistance; partial-SOI LDMOS power devices; silicon window polarity; two-dimensional simulation; Doping; Educational institutions; Electric fields; Electron devices; Films; Silicon; Substrates; Breakdown voltage (BV); LDMOSFET; on-resistance (Ron); partial-SOI (PSOI);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design (ASQED), 2013 5th Asia Symposium on
Conference_Location :
Penang
Print_ISBN :
978-1-4799-1312-1
Type :
conf
DOI :
10.1109/ASQED.2013.6643600
Filename :
6643600
Link To Document :
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