DocumentCode
1857071
Title
Effect of N-induced scattering centers on electron mobility in CBE grown GaAsN films
Author
Inagaki, M. ; Kimura, S. ; Ikeda, K. ; Kojima, N. ; Ohshita, Y. ; Yamaguchi, M.
Author_Institution
Toyota Technol. Inst., Nagoya, Japan
fYear
2011
fDate
19-24 June 2011
Abstract
Low electron mobility causes the short diffusion length and high resistivity. To realize the tandem solar cells with high performance, the mobility must be increased. In this paper, the mechanisms that reduce electron mobility in GaAs1-xNx (0.0000<;x<;0.0115) were investigated from the dependence of Hall electron mobility on N composition, temperature and carrier concentration. The mobility was independent of impurity concentrations. There is a peak in the mobility as a function of temperature, such as GaAs. However, the temperature dependence changed to monotonic increase as N composition x increased to 0.0115. The increase of free carrier concentration caused improvement of the mobility at lower temperature. Hence, not ionized impurity scattering but N-related scattering was dominant scattering at low temperature. In addition, the contribution of N-related scattering became dominant comparison with alloy and phonon scattering in the higher N composition.
Keywords
Hall mobility; III-V semiconductors; carrier density; chemical beam epitaxial growth; electron mobility; gallium arsenide; solar cells; ternary semiconductors; wide band gap semiconductors; CBE growth; GaAsN; Hall electron mobility; N-induced scattering center; carrier concentration; chemical beam epitaxy; tandem solar cells; Electron mobility; Films; Gallium arsenide; Impurities; Metals; Scattering; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location
Seattle, WA
ISSN
0160-8371
Print_ISBN
978-1-4244-9966-3
Type
conf
DOI
10.1109/PVSC.2011.6186001
Filename
6186001
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