Title :
Automatic parameter control system for semiconductor structures manufacturing
Author :
Starostenko, Oleg ; Luna, José G Vázquez ; Khoma, Vladimir
Author_Institution :
Dept. en Sistemas Comput., Univ. de las Americas Puebla, Mexico
Abstract :
This paper describes analysis of measurement equipment design concepts and some advances in our research regarding the construction of computer based facilities for electrical and non-electrical complex parameters measurements of semiconductor structures. CV- and GV-characteristics system has been designed and used for automatic parameter control of semiconductors production particularly for technological process control of the charge-coupled CCD device manufacturing. The proposed measuring system has been analyzed to estimate performance of semiconductor characteristics acquisition and processing. That information is used as a feedback action to improve a technological process of the CCD structure manufacturing
Keywords :
integrated circuit manufacture; integrated circuit measurement; parameter estimation; process control; CCD structure; CV-characteristics; GV-characteristics; automatic parameter control; automatic parameter control system; complex parameters measurements; computer based facilities; measurement equipment design concepts; semiconductor characteristics acquisition; semiconductor structures manufacturing; technological process; technological process control; Automatic control; Charge coupled devices; Control systems; Electric variables measurement; Manufacturing automation; Manufacturing processes; Performance analysis; Process control; Production systems; Semiconductor device manufacture;
Conference_Titel :
Design of Mixed-Mode Integrated Circuits and Applications, 1999. Third International Workshop on
Conference_Location :
Puerto Vallarta
Print_ISBN :
0-7803-5588-1
DOI :
10.1109/MMICA.1999.833598
