• DocumentCode
    1857438
  • Title

    The manufacture of the nano V1-x-y WxSiyO22 thin films for the uncooled IR detectors by the sol-gel method

  • Author

    Yang, Thomas C K ; Hsu, Kuo-Ping

  • Author_Institution
    Dept. Chem. Eng. & Biotechnol., Nat. Taipei Univ. of Technol.
  • fYear
    2005
  • fDate
    15-15 July 2005
  • Firstpage
    417
  • Lastpage
    420
  • Abstract
    Thermochromic properties of vanadium dioxide thin films are applied to bolometer materials for the uncooled microbolometer due to their high temperature coefficient of resistance (TCR) at room temperature. In this paper sol-gel method was used to manufacture the V 1-x -yWxSiyO2 thin films and the quantities of the tungsten- and SiO2-doped VO2 thin films were determined by the design of experiments. V1-x -y WxSiyO2 thin films were deposited on a non-alkali glass substrate by the spin coating process. Then the thin films were calcined at 500degC under a reducing gas flow (H2 -Ar, 5%-95%) in an atmospheric control furnace. The chemical stoichiometry of the films was characterized by the ESCA. AFM and XRD measurements were performed to study the surface morphology and the crystallinity. In addition, the optical and electrical properties of the thin films were measured by FTIR, UV-Vis Spectrometer, Ellipsometry and High Resistance Meter
  • Keywords
    ESCA; Fourier transform spectra; X-ray diffraction; atomic force microscopy; calcination; ellipsometry; infrared detectors; infrared spectra; nanostructured materials; sol-gel processing; spin coating; stoichiometry; surface morphology; thermo-optical effects; thin films; tungsten compounds; ultraviolet spectra; vanadium compounds; visible spectra; 293 to 298 K; 500 C; AFM measurements; ESCA measurements; FTIR; H2-Ar; SiO2-doped vanadium dioxide thin films; TCR; UV-Vis spectrometer; V1-x-yWxSiyO2; XRD measurements; atmospheric control furnace; calcination; chemical stoichiometry; crystallinity; electrical properties; ellipsometry; gas flow; high resistance meter; high temperature coefficient of resistance; nano V1-x -yWxSiyO2 thin films; nonalkali glass substrate; optical properties; sol-gel method; spin coating process; surface morphology; thermochromic properties; tungsten-doped vanadium dioxide thin films; uncooled IR detectors; uncooled microbolometer; Atmospheric measurements; Bolometers; Electrical resistance measurement; Manufacturing; Optical films; Semiconductor thin films; Temperature; Thermal resistance; Thermochromism; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2005. 5th IEEE Conference on
  • Conference_Location
    Nagoya, Japan
  • Print_ISBN
    0-7803-9199-3
  • Type

    conf

  • DOI
    10.1109/NANO.2005.1500746
  • Filename
    1500746