• DocumentCode
    1857520
  • Title

    An RFMEMS based reflection type C-Ku band tunable band pass filter

  • Author

    Lee, S.-S. ; Nishino, T. ; Kitsukawa, Y. ; Konno, N. ; Miyazaki, M.

  • Author_Institution
    Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Amagasaki, Japan
  • fYear
    2009
  • fDate
    21-25 June 2009
  • Firstpage
    777
  • Lastpage
    780
  • Abstract
    In this paper, we present a novel band reflection type C-Ku band tunable band pass filter (BPF), which has been developed by surface micromachining technology for wireless applications. Our BPF consists of two identical band rejection filters (BRF) and a coplanar waveguide (CPW) 90-degree hybrid coupler. The BRF is composed of metal contact type RFMEMS switches, inductors and capacitors. In the fabrication, a sacrificial layer is applied to not only RFMEMS switch but also inductor, capacitor and CPW 90-degree hybrid coupler to form air bridge, short avoidable structure and enhanced capacitive coupling, respectively. Each tuning state in C- to Ku-band is achieved by RFMEMS switch operation, which selects adequate capacitors or inductors designed corresponding to each tuning state. The insertion losses of the BPF were 3.2 dB, 3.6 dB and 3.5 dB at 8 GHz, 12 GHz and 16 GHz, respectively.
  • Keywords
    band-pass filters; band-stop filters; capacitors; circuit tuning; coplanar waveguides; inductors; microswitches; microwave filters; RFMEMS switches; band rejection filters; capacitors; coplanar waveguide; enhanced capacitive coupling; frequency 12 GHz to 18 GHz; frequency 8 GHz; hybrid coupler; inductors; loss 3.2 dB; loss 3.5 dB; loss 3.6 dB; surface micromachining technology; tunable band pass filter; Band pass filters; Bridges; Capacitors; Contacts; Coplanar waveguides; Fabrication; Inductors; Micromachining; Reflection; Switches; CPW hybrid coupler; RFMEMS switch; band rejection filter; tunable band pass filter;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International
  • Conference_Location
    Denver, CO
  • Print_ISBN
    978-1-4244-4190-7
  • Electronic_ISBN
    978-1-4244-4193-8
  • Type

    conf

  • DOI
    10.1109/SENSOR.2009.5285650
  • Filename
    5285650