• DocumentCode
    1857717
  • Title

    Atomic metal contacts on the semiconductor by CVD

  • Author

    Lung, Chien-Hwa ; Lin, Ching-Fuh ; Chang, Che-Chen

  • Author_Institution
    Nat. Taiwan Univ., Taipei, Taiwan
  • fYear
    2005
  • fDate
    11-15 July 2005
  • Firstpage
    315
  • Abstract
    The continuing advances in miniaturization of semiconductor devices have seriously challenged the contact technology. This work explored the chemical reaction involved in the bottom-up formation of metal contacts using a linear atomic metal string complex for CVD. The adsorption and surface reaction of the complex on GaN were characterized using x-ray photoelectron spectroscopy and secondary ion mass spectrometry. The complex may anchor on the substrate surface with the metal string inclined to the surface. A change in bonding configuration of the chromium metal-string complex took place upon increasing complex dose to the substrate.
  • Keywords
    III-V semiconductors; X-ray photoelectron spectra; adsorption; bonds (chemical); chemical vapour deposition; gallium compounds; nanocontacts; organometallic compounds; secondary ion mass spectra; surface chemistry; CVD; GaN; X-ray photoelectron spectroscopy; adsorption; atomic metal contact; atomic metal string complex; bonding; chemical reaction; chromium metal-string complex; secondary ion mass spectrometry; semiconductor devices; surface reaction; Atomic layer deposition; Atomic measurements; Bonding; Chemical compounds; Chemical technology; Chemical vapor deposition; Chemistry; Semiconductor films; Substrates; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2005. 5th IEEE Conference on
  • Print_ISBN
    0-7803-9199-3
  • Type

    conf

  • DOI
    10.1109/NANO.2005.1500759
  • Filename
    1500759