DocumentCode
1857747
Title
Optical properties of InGaN/GaN nanorods fabricated by inductively coupled plasma etching
Author
Hsueh, T.H. ; Sheu, J.K. ; Chang, Y.H. ; Kuo, H.C. ; Wang, S.C.
Author_Institution
Dept. of Photonics & Inst. of Electro-Opt. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fYear
2005
fDate
11-15 July 2005
Firstpage
320
Abstract
The fabrication of In0.3Ga0.7N/GaN multiple quantum wells nanorods with diameters of 60∼100 nm and their optical characteristics performed by micron photo-luminescence measurements are presented. The photoluminescence (PL) spectra with sharp linewidths of typically 1.5 nm were observed at 4K. The excitation power dependent spectra show that no energy shift was observed for these sharp peaks. Increasing the excitation power instead leads to an occurrence of new, sharp PL peaks at the higher energy tail of the PL spectra, which suggest that excitons are strongly confined in quantum dots-like region or localization centers.
Keywords
III-V semiconductors; excitons; gallium compounds; indium compounds; localised states; nanostructured materials; photoluminescence; semiconductor quantum wells; sputter etching; wide band gap semiconductors; 4 K; 60 to 100 nm; In0.3Ga0.7N-GaN; In0.3Ga0.7N-GaN multiple quantum wells nanorod; excitation power; inductively coupled plasma etching; localization centers; micron photoluminescence measurement; optical properties; Etching; Gallium nitride; Optical coupling; Optical device fabrication; Performance evaluation; Photoluminescence; Plasma applications; Plasma measurements; Plasma properties; Tail;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN
0-7803-9199-3
Type
conf
DOI
10.1109/NANO.2005.1500760
Filename
1500760
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