• DocumentCode
    1857747
  • Title

    Optical properties of InGaN/GaN nanorods fabricated by inductively coupled plasma etching

  • Author

    Hsueh, T.H. ; Sheu, J.K. ; Chang, Y.H. ; Kuo, H.C. ; Wang, S.C.

  • Author_Institution
    Dept. of Photonics & Inst. of Electro-Opt. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • fYear
    2005
  • fDate
    11-15 July 2005
  • Firstpage
    320
  • Abstract
    The fabrication of In0.3Ga0.7N/GaN multiple quantum wells nanorods with diameters of 60∼100 nm and their optical characteristics performed by micron photo-luminescence measurements are presented. The photoluminescence (PL) spectra with sharp linewidths of typically 1.5 nm were observed at 4K. The excitation power dependent spectra show that no energy shift was observed for these sharp peaks. Increasing the excitation power instead leads to an occurrence of new, sharp PL peaks at the higher energy tail of the PL spectra, which suggest that excitons are strongly confined in quantum dots-like region or localization centers.
  • Keywords
    III-V semiconductors; excitons; gallium compounds; indium compounds; localised states; nanostructured materials; photoluminescence; semiconductor quantum wells; sputter etching; wide band gap semiconductors; 4 K; 60 to 100 nm; In0.3Ga0.7N-GaN; In0.3Ga0.7N-GaN multiple quantum wells nanorod; excitation power; inductively coupled plasma etching; localization centers; micron photoluminescence measurement; optical properties; Etching; Gallium nitride; Optical coupling; Optical device fabrication; Performance evaluation; Photoluminescence; Plasma applications; Plasma measurements; Plasma properties; Tail;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2005. 5th IEEE Conference on
  • Print_ISBN
    0-7803-9199-3
  • Type

    conf

  • DOI
    10.1109/NANO.2005.1500760
  • Filename
    1500760