DocumentCode :
1857866
Title :
Fabrication of a piezoresistive pressure sensor for enhancing sensitivity using silicon nanowire
Author :
Kim, J.H. ; Park, K.T. ; Kim, H.C. ; Chun, K.
Author_Institution :
SoEE, Seoul Nat. Univ., Seoul, South Korea
fYear :
2009
fDate :
21-25 June 2009
Firstpage :
1936
Lastpage :
1939
Abstract :
This paper presents a piezoresistive pressure sensor to enhance sensitivity using silicon nanowire. According to published paper, silicon nanowire under 340 nm has good piezoresistive effect. Silicon nanowire of 140 times 200 nm2 size has seven times more piezoresistive effect than bulk silicon. This paper proposes the piezoresistive pressure sensor using the high piezoresistive effect of the silicon nanowire. The nanowire is fabricated to be connected like a bridge between the bossed silicon diaphragm and the edge of the silicon substrate. The fabricated piezoresistive pressure sensor has high sensitivity of 337.5 mV/VmiddotMPa and dynamic range of 150 kPa ~ 300 kPa. The pressure sensor size is less than 1 mm2 using diaphragm of 200 times 200 mum2.
Keywords :
nanowires; piezoresistive devices; pressure sensors; bossed silicon diaphragm; bulk silicon; high piezoresistive effect; piezoresistive pressure sensor; sensitivity; silicon nanowire; silicon substrate; Biomembranes; Biosensors; Capacitive sensors; Etching; Fabrication; Immune system; Piezoresistance; Pressure measurement; Silicon compounds; Stress; Piezoresistive; Pressure sensor; Silicon nanowire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-4190-7
Electronic_ISBN :
978-1-4244-4193-8
Type :
conf
DOI :
10.1109/SENSOR.2009.5285668
Filename :
5285668
Link To Document :
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