DocumentCode :
1857967
Title :
Comparison of laser link crossbar and Omega network switching for wafer-scale integration defect avoidance
Author :
Chapman, G.H. ; Fang, K.
Author_Institution :
Sch. of Eng. Sci., Simon Fraser Univ., Burnaby, BC, Canada
fYear :
1994
fDate :
19-21 Jan 1994
Firstpage :
352
Lastpage :
361
Abstract :
A study is presented of the design tradeoffs between two wafer scale defect avoidance methods: laser linking and active switches. Laser linking methods use laser processing to make signal line connections and cuts. Alternately active transistor switching elements, like the Omega network, can circumvent defects. WSI systems would benefit from a combination of both methods. The requirements of both for silicon area, signal delay, power consumption, probable switch yield and defect avoidance flexibility are considered. As an experimental vehicle an 8×8 Omega network and laser link crossbar switch was fabricated and tested
Keywords :
VLSI; multiprocessor interconnection networks; network routing; parallel architectures; Omega network switching; active transistor switching elements; defect avoidance; defect avoidance flexibility; laser link crossbar; laser processing; power consumption; probable switch yield; signal delay; signal line connections; signal routing; wafer-scale integration; Delay; Energy consumption; Joining processes; Laser beam cutting; Optical design; Signal processing; Silicon; Switches; Testing; Vehicles;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Wafer Scale Integration, 1994. Proceedings., Sixth Annual IEEE International Conference on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-1850-1
Type :
conf
DOI :
10.1109/ICWSI.1994.291238
Filename :
291238
Link To Document :
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