• DocumentCode
    1858695
  • Title

    InAlAs epitaxial growth for wide band gap solar cells

  • Author

    Leite, Marina S. ; Woo, Robyn L. ; Hong, William D. ; Law, Daniel C. ; Atwater, Harry A.

  • Author_Institution
    Thomas J. Watson Labs. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
  • fYear
    2011
  • fDate
    19-24 June 2011
  • Abstract
    We demonstrate high quality InAlAs epitaxial growth by metalorganic vapor phase epitaxy and wide band gap solar cell fabrication. X-ray diffraction and transmission electron microscopy were used to characterize the crystalline quality of the epitaxial InAlAs grown. InAlAs solar cells lattice-matched to InP were grown and electrically characterized under AM 1.5 global 1-sun illumination. Window layers with different composition and, therefore, band gap energies were used to compare its effect on the overall device performance. In order to improve the electrical contact at the top window (Al-rich), an InGaAs cap layer was used. The resulting first generation of InAlAs solar cells showed an efficiency higher than 14 %, open circuit voltage of Voc = 1 V, Jsc = 19.3 mA/cm2, and maximum external quantum efficiency of 81 %.
  • Keywords
    III-V semiconductors; X-ray diffraction; indium compounds; solar cells; transmission electron microscopy; vapour phase epitaxial growth; InAlAs; InP; X-ray diffraction; electrical contact; epitaxial growth; metalorganic vapor phase epitaxy; open circuit voltage; transmission electron microscopy; wide band gap solar cell fabrication; Epitaxial growth; Indium compounds; Indium phosphide; Metals; Photonic band gap; Photovoltaic cells; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
  • Conference_Location
    Seattle, WA
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-9966-3
  • Type

    conf

  • DOI
    10.1109/PVSC.2011.6186070
  • Filename
    6186070