DocumentCode
1858695
Title
InAlAs epitaxial growth for wide band gap solar cells
Author
Leite, Marina S. ; Woo, Robyn L. ; Hong, William D. ; Law, Daniel C. ; Atwater, Harry A.
Author_Institution
Thomas J. Watson Labs. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
fYear
2011
fDate
19-24 June 2011
Abstract
We demonstrate high quality InAlAs epitaxial growth by metalorganic vapor phase epitaxy and wide band gap solar cell fabrication. X-ray diffraction and transmission electron microscopy were used to characterize the crystalline quality of the epitaxial InAlAs grown. InAlAs solar cells lattice-matched to InP were grown and electrically characterized under AM 1.5 global 1-sun illumination. Window layers with different composition and, therefore, band gap energies were used to compare its effect on the overall device performance. In order to improve the electrical contact at the top window (Al-rich), an InGaAs cap layer was used. The resulting first generation of InAlAs solar cells showed an efficiency higher than 14 %, open circuit voltage of Voc = 1 V, Jsc = 19.3 mA/cm2, and maximum external quantum efficiency of 81 %.
Keywords
III-V semiconductors; X-ray diffraction; indium compounds; solar cells; transmission electron microscopy; vapour phase epitaxial growth; InAlAs; InP; X-ray diffraction; electrical contact; epitaxial growth; metalorganic vapor phase epitaxy; open circuit voltage; transmission electron microscopy; wide band gap solar cell fabrication; Epitaxial growth; Indium compounds; Indium phosphide; Metals; Photonic band gap; Photovoltaic cells; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location
Seattle, WA
ISSN
0160-8371
Print_ISBN
978-1-4244-9966-3
Type
conf
DOI
10.1109/PVSC.2011.6186070
Filename
6186070
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