Title :
Growth and characterization of vertically aligned 1D IrO2 nanocrystals via reactive sputtering
Author :
Korotcov, A.V. ; Huang, Y.S. ; Tsai, D.S. ; Tiong, K.K.
Author_Institution :
Dept. of Electron. Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
Abstract :
We report the preparation of 1D vertically aligned IrO2 nanocrystals on LiNbO3 (100) substrates by reactive magnetron sputtering with Ir metal target. The effects of sputtering conditions such as pressure, rf power, substrate temperature etc. have been presented and discussed. The surface morphology, structural and spectroscopic properties of the as-grown nanocrystals have been characterized using field-emission scanning electron microscopy (FESEM), X-ray diffractometry (XRD) and micro-Raman scattering. The red-shift and asymmetric broadening of Raman lineshape have been analyzed and attributed to both the size effect and residual stress.
Keywords :
Raman spectra; X-ray diffraction; field emission electron microscopy; internal stresses; iridium compounds; nanostructured materials; nanotechnology; red shift; scanning electron microscopy; spectral line broadening; sputter deposition; surface morphology; FESEM; Ir metal target; IrO2; LiNbO3; LiNbO3 (100) substrates; Raman lineshape; X-ray diffractometry; XRD; asymmetric broadening; field-emission scanning electron microscopy; microRaman scattering; reactive magnetron sputtering; red-shift; residual stress; rf power; size effect; spectroscopic properties; sputtering conditions; structural properties; substrate temperature; surface morphology; vertically aligned 1D IrO2 nanocrystals; Nanocrystals; Raman scattering; Residual stresses; Scanning electron microscopy; Spectroscopy; Sputtering; Surface morphology; Temperature; X-ray diffraction; X-ray scattering;
Conference_Titel :
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN :
0-7803-9199-3
DOI :
10.1109/NANO.2005.1500830
