Title :
The effect of cathode deposition on the behavior of field emission
Author :
Takahashi, E. ; Ebe, A. ; Ogata, K. ; Hayashi, Y. ; Sone, M.
Author_Institution :
Musashi Inst. of Technol., Tokyo, Japan
Abstract :
It is shown that cathode deposition by the ion vapour deposition method makes the number of field emission sites decrease and also makes field emission difficult. The number of electron emitted from individual site are also decreased by cathode deposition. It is predicted that the metallic whisker model and the non-metallic model are intermingled in the field emission of a normal cathode
Keywords :
electron field emission; cathode; field emission; ion vapour deposition; metallic whisker model; nonmetallic model; surface condition; Cathodes; Charge-coupled image sensors; Chemicals; Electric breakdown; Electron emission; Electrostatics; Oscilloscopes; Predictive models; Surface discharges; Vacuum breakdown;
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1994., IEEE 1994 Annual Report., Conference on
Conference_Location :
Arlington, TX
Print_ISBN :
0-7803-1950-8
DOI :
10.1109/CEIDP.1994.592052
