Title :
Comparison of horizontal and vertical thin film contact
Author :
Peng Zhang ; Lau, Y.Y. ; Gilgenbach, R.M.
Author_Institution :
Dept. of Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI, USA
Abstract :
This paper contrasts the very different spreading resistance and current crowding behaviors between horizontal and vertical thin film contact. Both Cartesian and circular contacts are analyzed. Accurate analytical scaling laws have been obtained for arbitrary aspect ratios and resistivity ratios, and validated against known limits, numerical simulations and experiments.
Keywords :
contact resistance; electrical contacts; numerical analysis; thin films; Cartesian contact; analytical scaling laws; circular contact; current crowding behaviors; horizontal thin film contact; numerical simulations; spreading resistance; vertical thin film contact; Conductivity; Contacts; Electron devices; Geometry; Heating; Proximity effects; Resistance; Current crowding; contact resistance; spreading resistance;
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2015 IEEE International
Conference_Location :
Beijing
Print_ISBN :
978-1-4799-7109-1
DOI :
10.1109/IVEC.2015.7223790
