DocumentCode
1860242
Title
Comparison of horizontal and vertical thin film contact
Author
Peng Zhang ; Lau, Y.Y. ; Gilgenbach, R.M.
Author_Institution
Dept. of Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI, USA
fYear
2015
fDate
27-29 April 2015
Firstpage
1
Lastpage
2
Abstract
This paper contrasts the very different spreading resistance and current crowding behaviors between horizontal and vertical thin film contact. Both Cartesian and circular contacts are analyzed. Accurate analytical scaling laws have been obtained for arbitrary aspect ratios and resistivity ratios, and validated against known limits, numerical simulations and experiments.
Keywords
contact resistance; electrical contacts; numerical analysis; thin films; Cartesian contact; analytical scaling laws; circular contact; current crowding behaviors; horizontal thin film contact; numerical simulations; spreading resistance; vertical thin film contact; Conductivity; Contacts; Electron devices; Geometry; Heating; Proximity effects; Resistance; Current crowding; contact resistance; spreading resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference (IVEC), 2015 IEEE International
Conference_Location
Beijing
Print_ISBN
978-1-4799-7109-1
Type
conf
DOI
10.1109/IVEC.2015.7223790
Filename
7223790
Link To Document