• DocumentCode
    1860245
  • Title

    An estimation for EUV radiation energy using FLN

  • Author

    Zhang, C.H. ; Katsuki, S. ; Horita, H. ; Kimura, A. ; Namihira, T. ; Akiyama, H.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Kumamoto Univ., Japan
  • fYear
    2005
  • fDate
    11-15 July 2005
  • Firstpage
    689
  • Abstract
    Recently, a Z-pinch GDPP light source as EUV for next generation lithography has being developed in our lab. However, the physics of the processes, plasma and surface discharges produced, magneto-hydrodynamic, photon radiation transport, and plasma-electrode interactions, which lead to EUV emission, is intrinsically complex. Many simplifying assumption are inevitable with numerical simulations, resulting in low-credibility outcomes. A FLN with GI learning algorithm has been first employed to construct a predictive model of EUV radiation energy and to overcome the uncertainty of the operational parameters. The research shows that EUV radiation energy can be effectively estimated by using FLN.
  • Keywords
    Z pinch; lithography; magnetohydrodynamics; neural nets; surface discharges; ultraviolet radiation effects; EUV radiation energy; FLN; GI learning algorithm; Z-pinch GDPP light source; functional link network; lithography; magnetohydrodynamics; photon radiation transport; plasma discharges; plasma-electrode interactions; surface discharges; Fault location; Light sources; Lithography; Numerical simulation; Physics; Plasma simulation; Plasma sources; Plasma transport processes; Predictive models; Surface discharges;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2005. 5th IEEE Conference on
  • Print_ISBN
    0-7803-9199-3
  • Type

    conf

  • DOI
    10.1109/NANO.2005.1500859
  • Filename
    1500859