DocumentCode
1860245
Title
An estimation for EUV radiation energy using FLN
Author
Zhang, C.H. ; Katsuki, S. ; Horita, H. ; Kimura, A. ; Namihira, T. ; Akiyama, H.
Author_Institution
Dept. of Electr. & Comput. Eng., Kumamoto Univ., Japan
fYear
2005
fDate
11-15 July 2005
Firstpage
689
Abstract
Recently, a Z-pinch GDPP light source as EUV for next generation lithography has being developed in our lab. However, the physics of the processes, plasma and surface discharges produced, magneto-hydrodynamic, photon radiation transport, and plasma-electrode interactions, which lead to EUV emission, is intrinsically complex. Many simplifying assumption are inevitable with numerical simulations, resulting in low-credibility outcomes. A FLN with GI learning algorithm has been first employed to construct a predictive model of EUV radiation energy and to overcome the uncertainty of the operational parameters. The research shows that EUV radiation energy can be effectively estimated by using FLN.
Keywords
Z pinch; lithography; magnetohydrodynamics; neural nets; surface discharges; ultraviolet radiation effects; EUV radiation energy; FLN; GI learning algorithm; Z-pinch GDPP light source; functional link network; lithography; magnetohydrodynamics; photon radiation transport; plasma discharges; plasma-electrode interactions; surface discharges; Fault location; Light sources; Lithography; Numerical simulation; Physics; Plasma simulation; Plasma sources; Plasma transport processes; Predictive models; Surface discharges;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2005. 5th IEEE Conference on
Print_ISBN
0-7803-9199-3
Type
conf
DOI
10.1109/NANO.2005.1500859
Filename
1500859
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