DocumentCode
186045
Title
Residual noise reduction in AlN resonators by prolonged RF excitation
Author
Nancy, Saldanha ; Usama, Zaghloul ; Gianluca, Piazza
Author_Institution
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear
2014
fDate
19-22 May 2014
Firstpage
1
Lastpage
4
Abstract
Very low phase noise oscillators are highly desirable for military radar applications. In order to improve phase noise performance of micro-electro-mechanical-systems (MEMS) oscillators, it is essential to reduce the residual noise of the resonator, which serves as the frequency selective element. The oscillator closed loop phase noise is typically limited by the 1/f flicker noise intrinsic to the MEMS resonator acting as the frequency selective element. In this work, the ability to reduce the 1/f flicker noise and consequently the residual phase noise of 1GHz MEMS aluminum nitride (AlN) contour mode resonators (CMR) by prolonged exposure to RF power at resonant frequency is explored.
Keywords
1/f noise; III-V semiconductors; aluminium compounds; frequency selective surfaces; micromechanical devices; military radar; oscillators; phase noise; resonators; wide band gap semiconductors; 1/f flicker noise; AlN; CMR; MEMS oscillators; MEMS resonator; RF excitation; RF power; contour mode resonators; frequency 1 GHz; frequency selective element; microelectromechanical systems; military radar applications; phase noise oscillators; phase noise performance; residual noise reduction; resonant frequency; Frequency measurement; III-V semiconductor materials; Noise measurement; Phase noise; Radio frequency; Resonant frequency; MEMS resonators; contour mode resonators; resonator phase noise;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium (FCS), 2014 IEEE International
Conference_Location
Taipei
Type
conf
DOI
10.1109/FCS.2014.6859995
Filename
6859995
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