DocumentCode :
1860670
Title :
Polarization and electron injection in silicon nitride induced by protons
Author :
Kliem, H. ; Homann, M.
Author_Institution :
AB Mater. der Mikroelektronik, Tech. Univ. Hamburg-Harburg, Germany
fYear :
1994
fDate :
23-26 Oct 1994
Firstpage :
767
Lastpage :
772
Abstract :
The Kohlrausch behaviour of the polarization currents j=At, which is found in many disordered insulators, has been detected in thin films of silicon nitride also. The material contains a small amount of hydrogen due to the growth process. Using a palladium electrode it was possible to incorporate additional hydrogen ions, i.e. protons. This results in an increase of A in the above formula by a factor 10. Furthermore it is found that electron injection is enhanced by the presence of additional protons
Keywords :
dielectric thin films; Kohlrausch law; Si3N4:H; disordered insulators; electron injection; hydrogen ions; palladium electrode; polarization currents; protons; silicon nitride; thin films; Distribution functions; Electrodes; Electrons; Hydrogen; Insulation; Palladium; Partial discharges; Polarization; Protons; Semiconductor thin films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulation and Dielectric Phenomena, 1994., IEEE 1994 Annual Report., Conference on
Conference_Location :
Arlington, TX
Print_ISBN :
0-7803-1950-8
Type :
conf
DOI :
10.1109/CEIDP.1994.592062
Filename :
592062
Link To Document :
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