Title :
Parameter optimization method for fabricating 3D microstructures embedded in single-layer negative-tone photoresist
Author :
Hirai, Y. ; Sugano, K. ; Tsuchiya, T. ; Tabata, O.
Author_Institution :
Dept. of Micro Eng., Kyoto Univ., Kyoto, Japan
Abstract :
This paper reports on an optimization method for parameter sets for fabricating 3-dimensional microstructures in a single thick-film photoresist by the moving-mask UV lithography technique. The proposed optimization method employs the UV exposure calculation and the chemical behavior of chemically amplified negative-photoresist considering a cross-linking process during a thermal treatment of post-exposure bake to predict an optimum parameter range. In this paper, the validity of the proposed optimization method was successfully verified by evaluating a microchannel with ldquocmrdquo length covered by a top-membrane and its dependence on the process parameter sets.
Keywords :
masks; microchannel flow; optimisation; photoresists; ultraviolet lithography; 3D microstructures; UV lithography; cross linking; microchannel; moving mask; negative-tone photoresist; parameter optimization; single thick-film photoresist; single-layer photoresist; thermal treatment; Chemical processes; Diffraction; Fabrication; Lithography; Microchannel; Microfluidics; Microstructure; Optimization methods; Resists; Shape control; 3-dimensional microstructuring; embedded microchannel; thick-film photoresist;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-4190-7
Electronic_ISBN :
978-1-4244-4193-8
DOI :
10.1109/SENSOR.2009.5285769
