Title :
Stress measurement by X-ray diffraction in multicrystalline silicon solar cells
Author :
Popovich, V.A. ; van der Pers, N.M. ; Janssen, M. ; Bennett, I.J. ; Richardson, I.M.
Author_Institution :
Dept. of Mater. Sci. & Eng., Delft Univ. of Technol., Delft, Netherlands
Abstract :
Residual stresses in multicrystalline silicon solar cells has become a problem of growing importance, especially in view of silicon wafer thickness reduction. Without increasing the wafer strength, this leads to a high fracture rate during subsequent handling and processing steps. The most critical processing step during the manufacture of screen-printed solar cells is the firing of metallic contacts. In this work we evaluate the development of mechanical stresses in metallic contacts (Al, Ag and Al/Ag bus bars) with respect to different processing steps. For this purpose we combine X-ray diffraction (XRD) stress measurements, cell bowing measured with a laser scanning device and in-situ bending tests. It was found that the Al back contact layer represents a very porous/loose microstructure, which does not affect the mechanical stability of the solar cell. It was also found that the thickness and uniformity of the eutectic layer are the most important factors influencing the bowing of a complete solar cell. Furthermore, residual stresses and stresses developing during cell bending in Ag, Al/Ag bus are measured and discussed in detail in this work.
Keywords :
X-ray diffraction; elemental semiconductors; silicon; solar cells; stress measurement; Si; X-ray diffraction stress measurement; XRD stress measurements; in-situ bending tests; laser scanning device; metallic contacts; multicrystalline silicon solar cells; porous-loose microstructure; screen-printed solar cell manufacture; silicon wafer thickness reduction; solar cell mechanical stability; wafer strength; Aluminum; Firing; Photovoltaic cells; Residual stresses; Silicon; Stress measurement;
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location :
Seattle, WA
Print_ISBN :
978-1-4244-9966-3
DOI :
10.1109/PVSC.2011.6186149