Microfabrication techniques for millimeter-wave vacuum electronics

Author

Joye, Colin D. ; Cook, Alan M. ; Calame, Jeffrey P. ; Abe, David K. ; Nguyen, Khanh T. ; Wright, Edward L. ; Hanna, Jeremy M. ; Chernyavskiy, Igor A. ; Levush, Baruch

Author_Institution

U.S. Naval Res. Lab., Washington, DC, USA

fYear

2015

fDate

27-29 April 2015

Firstpage

1

Lastpage

2

Abstract

The principal challenge for creating vacuum electron devices in the millimeter-wave (mmW) frequency range is accurate fabrication of slow-wave circuits and other electromagnetic features with tight tolerance. Ultraviolet Photolithography and Electroforming (UV-LIGA) techniques are presented that allow tight tolerance control for slow wave circuits for the mmW and sub-mmW bands. We show how these techniques were applied at the W- and G-bands.

Keywords

LIGA; microfabrication; slow wave structures; vacuum tubes; G-bands; UV-LIGA techniques; W-bands; electroforming techniques; microfabrication techniques; millimeter-wave frequency range; millimeter-wave vacuum electronics; mmW frequency range; slow-wave circuits; sub-mmW bands; ultraviolet photolithography; vacuum electron devices; Copper; Electron tubes; Microfabrication; Millimeter wave technology; Resists; Photolithography; UV-LIGA; microfabrication; millimeter waves; traveling wave tube; vacuum electronics;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Electronics Conference (IVEC), 2015 IEEE International

Conference_Location

Beijing

Print_ISBN

978-1-4799-7109-1

Type

conf

DOI

10.1109/IVEC.2015.7223818

Filename

7223818