DocumentCode
1862382
Title
157-nm photosensitivity in germanosilicate planar waveguides
Author
Ness, S. ; Herman, Peter R.
Author_Institution
Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
fYear
1999
fDate
28-28 May 1999
Firstpage
76
Lastpage
77
Abstract
Summary form only given. This paper presents new results on the photosensitivity responses of waveguides and bulk glasses driven by 157 nm radiation from an F/sub 2/ laser. Single-mode slab waveguides were irradiated at various dose levels using a nitrogen-purged beam line. No enhancement techniques were employed to increase the photosensitivity response. Index changes were measured using a prism coupler technique (for waveguides) or by monitoring the diffraction efficiency of laser-induced Bragg gratings with a He-Ne laser probe beam. Surfaces were also examined by optical microscopy and atomic force microscopy (AFM).
Keywords
Bragg gratings; atomic force microscopy; germanate glasses; optical microscopy; optical planar waveguides; refractive index; silicon compounds; 157 nm; F/sub 2/ laser radiation; GeO/sub 2/-SiO/sub 2/; He-Ne laser probe beam; atomic force microscopy; bulk glasses; diffraction efficiency; germanosilicate; laser-induced Bragg gratings; nitrogen-purged beam line; optical microscopy; photosensitivity; planar waveguides; prism coupler technique; refractive index; single-mode slab waveguides; Atom optics; Atomic force microscopy; Glass; Laser beams; Laser transitions; Optical microscopy; Optical waveguides; Planar waveguides; Slabs; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-595-1
Type
conf
DOI
10.1109/CLEO.1999.833902
Filename
833902
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