• DocumentCode
    1862382
  • Title

    157-nm photosensitivity in germanosilicate planar waveguides

  • Author

    Ness, S. ; Herman, Peter R.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
  • fYear
    1999
  • fDate
    28-28 May 1999
  • Firstpage
    76
  • Lastpage
    77
  • Abstract
    Summary form only given. This paper presents new results on the photosensitivity responses of waveguides and bulk glasses driven by 157 nm radiation from an F/sub 2/ laser. Single-mode slab waveguides were irradiated at various dose levels using a nitrogen-purged beam line. No enhancement techniques were employed to increase the photosensitivity response. Index changes were measured using a prism coupler technique (for waveguides) or by monitoring the diffraction efficiency of laser-induced Bragg gratings with a He-Ne laser probe beam. Surfaces were also examined by optical microscopy and atomic force microscopy (AFM).
  • Keywords
    Bragg gratings; atomic force microscopy; germanate glasses; optical microscopy; optical planar waveguides; refractive index; silicon compounds; 157 nm; F/sub 2/ laser radiation; GeO/sub 2/-SiO/sub 2/; He-Ne laser probe beam; atomic force microscopy; bulk glasses; diffraction efficiency; germanosilicate; laser-induced Bragg gratings; nitrogen-purged beam line; optical microscopy; photosensitivity; planar waveguides; prism coupler technique; refractive index; single-mode slab waveguides; Atom optics; Atomic force microscopy; Glass; Laser beams; Laser transitions; Optical microscopy; Optical waveguides; Planar waveguides; Slabs; Waveguide lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
  • Conference_Location
    Baltimore, MD, USA
  • Print_ISBN
    1-55752-595-1
  • Type

    conf

  • DOI
    10.1109/CLEO.1999.833902
  • Filename
    833902